Imec, a leading semiconductor research company in Belgium, has announced significant breakthroughs in chipmaking at its joint lab with ASML.

The advancements were made possible through a new €350 million ($382 million) chip printing machine developed in collaboration with ASML.

This machine, known as the TWINSCAN EXE:500, was created at the ASML-imec High NA EUV Lithography Lab in Veldhoven, Netherlands.

Luc Van den Hove, president and CEO of imec, stated that these advancements confirm ASML's claims regarding the High NA machines' ability to produce smaller, faster, and more energy-efficient chips.

The achievement marks a significant milestone in microelectronics production, showcasing high-resolution patterning capabilities.

Imec demonstrated the capability to pattern designs for Dynamic Random-Access Memory (DRAM) chips in a single exposure, reducing manufacturing costs significantly.

Imec developed pattern designs that integrate storage node landing pads with bit line peripheries at a 32nm pitch, highlighting the efficiency of High NA technology.

The successful patterning results are attributed to optimized materials and processes developed by ASML, Imec, and their partners.

Van den Hove emphasized the importance of High NA EUV lithography for continuing the dimensional scaling of logic and memory technologies.

These developments indicate that leading chipmakers can expect to use the High NA tool to produce smaller, faster chips in the coming years.

ASML's stock rose by 6% in early market trading following the announcement of these advancements.