China has unveiled its first domestically produced high-energy hydrogen ion implanter, the POWER-750H, marking a significant step toward semiconductor self-sufficiency.

The move aligns with efforts to expand domestic semiconductor capacity and strengthen supply chains by localising equipment and cutting import dependency.

Historically, China depended on imports for high-energy hydrogen ion implanters, facing market monopolies and technology barriers abroad.

Analysts say the development could reshape global supply chains by diminishing the impact of Western export controls on critical equipment.

The China Institute of Atomic Energy says POWER-750H matches international standards and serves as a critical ion-implantation component for chip manufacturing.

This breakthrough signals China's broader push to develop indigenous semiconductor equipment and reduce reliance on imports.

The achievement builds on decades of nuclear physics and accelerator technology, leveraging tandem accelerator capabilities to reach its objective.

An ion implanter is a core tool for embedding dopant ions into silicon wafers, and POWER-750H is reported to match foreign performance standards.

Ion implantation has long been dominated by foreign suppliers, underscoring the significance of China’s new capability.

Industry context notes gaps in ion implantation despite progress in other tool areas, with POWER-750H filling a critical need in China’s domestic toolkit.

As one of the four core semiconductor tools, ion implanters have been a domain largely controlled by Western and Japanese suppliers, and POWER-750H helps address China’s domestic shortfall, though gaps remain in areas like EUV lithography.

This development supports China’s aim to reduce dependence on Western and Japanese suppliers and to meet policy goals of at least 50% domestically produced equipment in local fabrication.